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臺灣光罩為專門的光罩製造公司,生產IC業用的光罩,且提供客制化生產。
順應半導體行業的快速且持續發展,臺灣光罩持續開發新產品及制程,並壓縮產品交期,滿足客戶需求。
隨著晶圓代工廠IC晶片製造的不斷發產及進步,臺灣光罩提供一般Binary光罩外,更提供高階制程需求的KrF 及ArF光源相位移光罩 (PSM)。
相關光罩規格參考如下

  • 5X , 4X , 2.5X , 2X , Reticle for stepper
    Reticle Material Quartz
    Reticle Dimension 5"x5"x0.09"
    5"x5"x0.18"
    6"x6"x0.12"
    6"x6"x0.25"
    Stepper Type ASML,NIKON,CANON
    CD Tolerance Mean to target >=0.010 um
    Uniformity (3δ) >=0.010 um
    Registration >=0.020 um
    Defect 0.09 um
  • 1X Photomask (PE / MPA)
    Reticle Material Quartz
    Reticle Dimension 4"x4"x0.09"
    5"x5"x0.09"
    6"x6"x0.12"
    7"x7"x0.12"
    7"x7"x0.15"
    CD Tolerance ±0.1 um
    Registration ±0.2 um
    Defect <= 1dpsi @ 1um
  • 1X Photomask (PLA)
    Reticle Material SODA LINE
    Reticle Dimension 4"x4"x0.09"
    5"x5"x0.09"
    6"x6"x0.12"
    7"x7"x0.12"
    9"x9"x0.12"
    CD Tolerance ±0.3 um
    Registration ±2 um
    Defect <= 2dpsi @ 2um
  • UT 1X Reticle
    Reticle Material Quartz
    Reticle Dimension 3"x5"x0.09"
    5"x5"x0.09"
    6"x6"x0.25"
    CD Tolerance ±0.05 um
    Registration ±0.1 um
    Defect 0.5 um
  • Large Area Mask (LAM)
    Reticle Material SODA LINE
    Reticle Dimension 7"x7"x0.12"
    9"x9"x0.12"
    355.6x355.6x4.8 mm
    520x420x4.8 mm
    Min Line/Space 3 um
    Line Tolerance ±1.0 um
    Defect 5 um